Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2-Reference-Cited by-同舟云学术

Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2

Author:

Arts Karsten¹^ORCID,Thepass Harvey¹,Verheijen Marcel A.¹²,Puurunen Riikka L.³^ORCID,Kessels Wilhelmus M. M.¹^ORCID,Knoops Harm C. M.¹⁴^ORCID

Affiliation:

1. Eindhoven University of Technology, P.O. Box 513, 5600 MB Eindhoven, The Netherlands

2. Eurofins Material Science, High Tech, Campus 11, 5656 AE Eindhoven, The Netherlands

3. Aalto University School of Chemical Engineering, P.O. Box 16100, FI-00076 Aalto, Finland

4. Oxford Instruments Plasma Technology, North End, Bristol BS49 4AP, United Kingdom

Funder

Academy of Finland

Nederlandse Organisatie voor Wetenschappelijk Onderzoek

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,General Chemical Engineering,General Chemistry

Link

Reference47 articles.

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