Infrared Spectroscopy Study of Microstructures of Poly(silsesquioxane)s-Reference-Cited by-同舟云学术

Infrared Spectroscopy Study of Microstructures of Poly(silsesquioxane)s

Published:2008-01-16 Issue:4 Volume:20 Page:1548-1554
ISSN:0897-4756
Container-title:Chemistry of Materials
language:en
Short-container-title:Chem. Mater.

Author:

Park E. S.¹,Ro H. W.¹,Nguyen C. V.¹,Jaffe R. L.¹,Yoon D. Y.¹

Affiliation:

1. Department of Chemistry, Seoul National University, Seoul, 151-747, Korea, ELORET Corporation, NASA Ames Research Center, MS 229-1, Moffett Field, California 94305, and NASA Ames Research Center, MS 230-1, Moffett Field, California 94305

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,General Chemical Engineering,General Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/cm071575z

Reference33 articles.

1. Silsesquioxanes

2. In Search of Low- k Dielectrics

3. Preparation of low density poly(methylsilsesquioxane)s for LSI interlayer dielectrics with low dielectric constant. Fabrication of Ångstrom size pores prepared by baking trifluoropropylsilyl copolymers

4. Elimination of O2 plasma damage of low-k methyl silsesquioxane film by As implantation

5. ToF-SIMS studies of nanoporous PMSSQ materials: kinetics and reactions in the processing of low-K dielectrics for ULSI applications

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