ToF-SIMS studies of nanoporous PMSSQ materials: kinetics and reactions in the processing of low-K dielectrics for ULSI applications-Reference-Cited by-同舟云学术

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ToF-SIMS studies of nanoporous PMSSQ materials: kinetics and reactions in the processing of low-K dielectrics for ULSI applications

Published:2004-04 Issue:4 Volume:36 Page:304-310
ISSN:0142-2421
Container-title:Surface and Interface Analysis
language:en
Short-container-title:Surf. Interface Anal.

Author:

Lazzeri P.,Rubloff G. W.,Vanzetti L.,Briber R. M.,Anderle M.,Bersani M.,Park J. J.,Kim H.-C.,Volksen W.,Miller R. D.,Lin Z.

Publisher

Wiley

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Cited by 7 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Infrared Spectroscopy Study of Microstructures of Poly(silsesquioxane)s;Chemistry of Materials;2008-01-16

2. Characterisation of poly(methyl methacrylate) film deposited on iron powder particles by electropolymerization;Surface Science;2007-09

3. Time of flight secondary ion mass spectroscopy investigation of ultralow-k dielectric modifications in hydrogen and deuterium plasmas;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;2006

4. Assessment of thermal expansion coefficient of methylsilsesquioxane thin film;Journal of Polymer Science Part B: Polymer Physics;2006

5. Nanoporous Structure in Low-Dielectric Films with Positronium Annihilation Lifetime Spectroscopy;Chinese Physics Letters;2005-05-25

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