Affiliation:
1. Department of Chemistry and Picker Engineering Program, Smith College, Northampton, Massachusetts 01063
Publisher
American Chemical Society (ACS)
Subject
Surfaces, Coatings and Films,Physical and Theoretical Chemistry,General Energy,Electronic, Optical and Magnetic Materials
Reference43 articles.
1. Dependence of electron channel mobility on Si-SiO/sub 2/ interface microroughness
2. Wafer Cleaning Influence on the Roughness of the Si/SiO2 Interface
3. Moccio, S. V.; Sorsch, T. W.; Muller, D. A.; Evans-Lutterodt, K.; Timp, G.Presented at the MRS Spring Meeting, San Francisco, April 5−9, 1999.
4. Kern, W.InHandbook of Semiconductor Wafer Cleaning Technology: Science, Technology and Applications;Kern, W., Ed.Noyes Publications:East Windsor, NJ, 1993; pp3−57.
5. Growth of native oxide on a silicon surface
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