Characterization of surface processes during oxide CMP by in situ FTIR spectroscopy

Author:

Künzelmann U.,Schumacher-Härtwig H.

Publisher

Elsevier

Reference101 articles.

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4. Infrared spectroscopy of Si(111) and Si(100) surfaces after HF treatment: hydrogen termination and surface morphology;Chabal;J. Vac. Sci. Technol. A,1989

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