Enhanced Conductivity and Microstructure in Highly Textured TiN1–x/c-Al2O3 Thin Films-Reference-Cited by-同舟云学术

Enhanced Conductivity and Microstructure in Highly Textured TiN_1–x/c-Al₂O₃ Thin Films

Published:2022-01-03 Issue:2 Volume:7 Page:2041-2048
ISSN:2470-1343
Container-title:ACS Omega
language:en
Short-container-title:ACS Omega

Author:

Zintler Alexander¹^ORCID,Eilhardt Robert¹,Petzold Stefan²,Sharath Sankaramangalam Ulhas²,Bruder Enrico³,Kaiser Nico²^ORCID,Alff Lambert²,Molina-Luna Leopoldo¹^ORCID

Affiliation:

1. Advanced Electron Microscopy, Institute of Materials Science, TU Darmstadt, Alarich-Weiss-Str. 2, 64287 Darmstadt, Germany

2. Advanced Thin Film Technology, Institute of Materials Science, TU Darmstadt, Alarich-Weiss-Str. 2, 64287 Darmstadt, Germany

3. Physical Metallurgy, Institute of Materials Science, TU Darmstadt, Alarich-Weiss-Straße 2, 64287 Darmstadt, Germany

Funder

Bundesministerium f??r Bildung und Forschung

Deutsche Forschungsgemeinschaft

H2020 European Research Council

Publisher

American Chemical Society (ACS)

Subject

General Chemical Engineering,General Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/acsomega.1c05505

Reference67 articles.

1. Control of Switching Modes and Conductance Quantization in Oxygen Engineered HfOxbased Memristive Devices

2. Redox-Based Resistive Switching Memories - Nanoionic Mechanisms, Prospects, and Challenges

3. Forming‐Free Grain Boundary Engineered Hafnium Oxide Resistive Random Access Memory Devices

4. Ferroelectricity in hafnium oxide thin films

5. Evolution of phases and ferroelectric properties of thin Hf0.5Zr0.5O2 films according to the thickness and annealing temperature

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