Atomic Layer Deposition of Photoconductive Cu2O Thin Films
Author:
Affiliation:
1. Department of Chemistry, University of Helsinki, P.O. Box 55, FI-00014 Helsinki, Finland
2. Department of Physics, University of Helsinki, P.O. Box 43, FI-00014 Helsinki, Finland
Funder
FP7 Nanosciences, Nanotechnologies, Materials and new Production Technologies
Finnish Centre of Excellence in Atomic Layer Deposition
Publisher
American Chemical Society (ACS)
Subject
General Chemical Engineering,General Chemistry
Link
http://pubs.acs.org/doi/pdf/10.1021/acsomega.9b01351
Reference76 articles.
1. High-pressure x-ray study ofCu2O andAg2O
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4. Absorption coefficient of bulk and thin film Cu2O
5. Electronic structure ofCu2O and CuO
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