Electrostatic Force-Assisted Nanoimprint Lithography (EFAN)
Author:
Affiliation:
1. Nanostructure Laboratory, Department of Electrical Engineering, Princeton University, Princeton, New Jersey 08544
Publisher
American Chemical Society (ACS)
Subject
Mechanical Engineering,Condensed Matter Physics,General Materials Science,General Chemistry,Bioengineering
Link
https://pubs.acs.org/doi/pdf/10.1021/nl0480161
Reference6 articles.
1. Imprint of sub‐25 nm vias and trenches in polymers
2. Sub-10 nm imprint lithography and applications
3. Multilevel nanoimprint lithography with submicron alignment over 4 in. Si wafers
4. Chou, S. Y.; Zhang, W. U.S. Patent Publication No. 20040036201.
5. Willson, G.; Screenivasan, S.; Bonnecaze, R. U.S. Patent Publication No. 20030215577.
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