Kinetic and Mechanistic Studies of the Thermal Decomposition of Ti(N(CH3)2)4 during Chemical Vapor Deposition by in Situ Molecular Beam Mass Spectrometry-Reference-Cited by-同舟云学术

Kinetic and Mechanistic Studies of the Thermal Decomposition of Ti(N(CH3)2)4 during Chemical Vapor Deposition by in Situ Molecular Beam Mass Spectrometry

Published:2001-11-10 Issue:12 Volume:13 Page:4655-4660
ISSN:0897-4756
Container-title:Chemistry of Materials
language:en
Short-container-title:Chem. Mater.

Author:

Norton Edward T.¹,Amato-Wierda Carmela¹

Affiliation:

1. Materials Science Program, University of New Hampshire, Durham, New Hampshire 03824

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,General Chemical Engineering,General Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/cm0104708

Reference42 articles.

1. Elaboration and Properties of CVD Ti-N-Si Coatings

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