Influence of the Ozone Dose Time during Atomic Layer Deposition on the Ferroelectric and Pyroelectric Properties of 45 nm-Thick ZrO<sub>2</sub> Films-Reference-Cited by-同舟云学术

Influence of the Ozone Dose Time during Atomic Layer Deposition on the Ferroelectric and Pyroelectric Properties of 45 nm-Thick ZrO₂ Films

Author:

Xu Bohan¹^ORCID,Collins Liam²^ORCID,Holsgrove Kristina M.³,Mikolajick Thomas¹⁴^ORCID,Schroeder Uwe¹^ORCID,Lomenzo Patrick D.¹^ORCID

Affiliation:

1. NaMLab gGmbH, Dresden, Saxony 01187, Germany

2. Center for Nanophase Materials Sciences, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831, United States

3. School of Mathematics and Physics, Queen’s University Belfast, Belfast BT7 1NN, Northern Ireland, UK

4. Chair of Nanoelectronics, TU Dresden, Dresden 01187, Germany

Funder

Deutsche Forschungsgemeinschaft

Freistaat Sachsen

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,Electrochemistry,Electronic, Optical and Magnetic Materials

Link

Reference42 articles.

Cited by 11 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献