Surface-Functionalized Interfacial Self-Assembled Monolayers as Copper Electrode Diffusion Barriers for Oxide Semiconductor Thin-Film Transistor-Reference-Cited by-同舟云学术

Surface-Functionalized Interfacial Self-Assembled Monolayers as Copper Electrode Diffusion Barriers for Oxide Semiconductor Thin-Film Transistor

Published:2019-02-13 Issue:3 Volume:1 Page:430-436
ISSN:2637-6113
Container-title:ACS Applied Electronic Materials
language:en
Short-container-title:ACS Appl. Electron. Mater.

Author:

Lee Sung-Eun¹²,Park Jintaek¹²,Lee Junhee¹,Lee Eun Goo¹²,Im Changik¹,Na Hyunjae¹²,Cho Nam-Kwang¹,Lim Keon-Hee¹³,Kim Youn Sang¹⁴^ORCID

Affiliation:

1. Program in Nano Science and Technology, Graduate School of Convergence Science and Technology, Seoul National University, 1 Gwanak-ro, Gwanak-gu, Seoul 08826, Republic of Korea

2. Samsung Display Company, Ltd., 1 Samsung-ro, Giheung-gu, Yongin-si, Gyeonggi-Do 17113, Republic of Korea

3. Department of Mechanical Science and Engineering, University of Illinois at Urbana−Champaign, 1206 W. Green St., Urbana, Illinois 61801, United States

4. Advanced Institute of Convergence Technology, 145 Gwanggyo-ro, Yeongtong-gu, Suwon 16229, Republic of Korea

Funder

National Research Foundation of Korea

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,Electrochemistry,Electronic, Optical and Magnetic Materials

Link

https://pubs.acs.org/doi/pdf/10.1021/acsaelm.8b00132

Reference33 articles.

1. 18.1:Distinguished Paper: Novel TFT-LCD Technology for Motion Blur Reduction Using 120Hz Driving with McFi

2. Multifunctional Organic-Semiconductor Interfacial Layers for Solution-Processed Oxide-Semiconductor Thin-Film Transistor