Atomic Layer Deposition of Iridium Oxide Thin Films from Ir(acac)3 and Ozone-Reference-Cited by-同舟云学术

Atomic Layer Deposition of Iridium Oxide Thin Films from Ir(acac)3 and Ozone

Published:2008-03-28 Issue:9 Volume:20 Page:2903-2907
ISSN:0897-4756
Container-title:Chemistry of Materials
language:en
Short-container-title:Chem. Mater.

Author:

Hämäläinen Jani¹,Kemell Marianna¹,Munnik Frans¹,Kreissig Ulrich¹,Ritala Mikko¹,Leskelä Markku¹

Affiliation:

1. Laboratory of Inorganic Chemistry, Department of Chemistry, P.O. Box 55, FI-00014 University of Helsinki, Finland, and Institute of Ion Beam Physics and Materials Research, Forschungszentrum Dresden−Rossendorf, P.O. Box 510119, D-01314 Dresden, Germany

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,General Chemical Engineering,General Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/cm7030224

Reference50 articles.

1. Three dimensional (BA, SR) TIO3 stack capacitors for dram application

2. A SrRuO3/IrO2 top electrode FeRAM with Cu BEOL process for embedded memory of 130nm generation and beyond

3. A Quantum Trap MONOS Memory Device Using AlN

4. Atomic-layer deposited IrO2nanodots for charge-trap flash-memory devices

5. Highly efficient organic light-emitting diodes with hole injection layer of transition metal oxides

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