Thin-Film Barrier Performance of Zirconium Oxide Using the Low-Temperature Atomic Layer Deposition Method
Author:
Affiliation:
1. State Key Laboratory on Integrated Optoelectronics, College of Electronic Science and Engineering, Jilin University, Jilin 130012, China
2. College of Science, Changchun University of Science and Technology, Jilin 130022, China
Publisher
American Chemical Society (ACS)
Subject
General Materials Science
Link
https://pubs.acs.org/doi/pdf/10.1021/am500288q
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