Trimethylaluminum and Oxygen Atomic Layer Deposition on Hydroxyl-Free Cu(111)-Reference-Cited by-同舟云学术

Trimethylaluminum and Oxygen Atomic Layer Deposition on Hydroxyl-Free Cu(111)

Published:2015-07-23 Issue:30 Volume:7 Page:16428-16439
ISSN:1944-8244
Container-title:ACS Applied Materials & Interfaces
language:en
Short-container-title:ACS Appl. Mater. Interfaces

Author:

Gharachorlou Amir¹,Detwiler Michael D.¹,Gu Xiang-Kui¹,Mayr Lukas²³,Klötzer Bernhard²,Greeley Jeffrey¹,Reifenberger Ronald G.³⁴,Delgass W. Nicholas¹,Ribeiro Fabio H.¹,Zemlyanov Dmitry Y.³

Affiliation:

1. School of Chemical Engineering, Purdue University, West Lafayette, Indiana 47907, United States

2. Institute for Physical Chemistry, University of Innsbruck, A-6020 Innsbruck, Austria

3. Birck Nanotechnology Center, Purdue University, West Lafayette, Indiana 47907, United States

4. Department of Physics, Purdue University, West Lafayette, Indiana 47907, United States

Funder

Austrian Science Fund

Basic Energy Sciences

Publisher

American Chemical Society (ACS)

Subject

General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/acsami.5b03598

Reference61 articles.

1. Al2O3 and TiO2 Atomic Layer Deposition on Copper for Water Corrosion Resistance

2. Microstructure Evolution of Copper in Nanoscale Interconnect Features

3. Fabrication and characterization of sub-quarter-micron MOSFETs with a copper gate electrode

4. On the Mechanism of Low-Temperature Water Gas Shift Reaction on Copper

5. First-Principles Study on the Origin of the Different Selectivities for Methanol Steam Reforming on Cu(111) and Pd(111)

Cited by 41 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Mechanistically Informed Strategies for Site-Selective Atomic Layer Deposition;Chemistry of Materials;2024-09-13

2. Effects of solution processable CuI thin films with Al₂O₃-based sandwiched architecture for high-performance p-type transistor applications;Journal of Materials Chemistry C;2024

3. Combination of Multiple Operando and In-Situ Characterization Techniques in a Single Cluster System for Atomic Layer Deposition: Unraveling the Early Stages of Growth of Ultrathin Al2O3 Films on Metallic Ti Substrates;Inorganics;2023-12-14

4. Atomic Layer Deposition—A Versatile Toolbox for Designing/Engineering Electrodes for Advanced Supercapacitors;Advanced Science;2023-11-08

5. Preparation of wafer-scale highly conformalamorphous hafnium dioxide thin films by atomic layer deposition using a thermally stable boratabenzene ligand-containing hafnium precursor;Applied Surface Science;2023-05