Preparation of wafer-scale highly conformalamorphous hafnium dioxide thin films by atomic layer deposition using a thermally stable boratabenzene ligand-containing hafnium precursor-Reference-Cited by-同舟云学术

Preparation of wafer-scale highly conformalamorphous hafnium dioxide thin films by atomic layer deposition using a thermally stable boratabenzene ligand-containing hafnium precursor

Published:2023-05 Issue: Volume:620 Page:156834
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Ansari Mohd Zahid,Janicek Petr^ORCID,Park Ye Jin,NamGung Sook^ORCID,Cho Bo Yeon,Nandi Dip K.,Jang Yujin^ORCID,Bae Jong-Seong,Hong Tae Eun,Cheon Taehoon^ORCID,Song Wooseok,An Ki-Seok^ORCID,Kim Soo-Hyun^ORCID

Funder

Ministry of Science, ICT and Future Planning

NRF

Ministerstvo Školství, Mládeže a Tělovýchovy

Ulsan National Institute of Science and Technology

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

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