Reversible Adduct Formation of Trimethylgallium and Trimethylindium with Ammonia
Author:
Affiliation:
1. Sandia National Laboratories, P.O. Box 5800, MS-0601, Albuquerque, New Mexico 87185
Publisher
American Chemical Society (ACS)
Subject
Physical and Theoretical Chemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/jp046491h
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4. AlN and AlGaN growth using low-pressure metalorganic chemical vapor deposition
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