Nanoscale-Thick Thin Films of High-Density HfO2 for Bulk-like Optical Responses-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Nanoscale-Thick Thin Films of High-Density HfO2 for Bulk-like Optical Responses

Published:2021-09-30 Issue:10 Volume:4 Page:10836-10844
ISSN:2574-0970
Container-title:ACS Applied Nano Materials
language:en
Short-container-title:ACS Appl. Nano Mater.

Author:

Sun Lirong¹²,Jones John G.¹,Grant John T.¹²,Murphy Neil R.¹,Ramana C. V.³^ORCID,Eyink Kurt G.¹,Vernon Jonathan P.¹^ORCID,Stevenson Peter R.¹^ORCID

Affiliation:

1. Materials and Manufacturing Directorate, Air Force Research Laboratory, Wright-Patterson Air Force Base, Ohio 45433, United States

2. Azimuth Corporation, 2970 Presidential Drive, Suite 200, Beavercreek, Ohio 45324, United States

3. Center for Advanced Materials Research (CMR), University of Texas at El Paso, El Paso, Texas 79968, United States

Funder

Air Force Research Laboratory

Air Force Office of Scientific Research

NSF-PREM

Publisher

American Chemical Society (ACS)

Subject

General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/acsanm.1c02267

Reference56 articles.

1. HfO2 films with high laser damage threshold

2. An innovative method for preparation of sol–gel HfO2 films with high laser-induced damage threshold after high-temperature annealing

3. Highly-impermeable Al2O3/HfO2 moisture barrier films grown by low-temperature plasma-enhanced atomic layer deposition

4. Enhanced photoelectrochemical performance of WO3 film with HfO2 passivation layer

5. Ferroelectric HfO2-based materials for next-generation ferroelectric memories

Cited by 11 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Large-area (50 cm × 50 cm) optically transparent electromagnetic interference (EMI) shielding of ZTO/Ag/ZTO: an analytical/numerical and experimental study of optoelectrical and EMI shielding properties;Journal of Physics D: Applied Physics;2024-05-24

2. Hardness, Modulus, and Refractive Index of Plasma-Assisted Atomic-Layer-Deposited Hafnium Oxide Thin Films Doped with Aluminum Oxide;Nanomaterials;2023-05-10

3. Electrospun Light-emitting Tm3+-doped SiO2–HfO2 nanofiber for photonic applications;Journal of Luminescence;2023-05

4. Controlling the optical properties of hafnium dioxide thin films deposited with electron cyclotron resonance ion beam deposition;Thin Solid Films;2023-04

5. Optical and electrical characteristics of HfO2/Cu40Ag60/HfO2 films prepared by pulsed laser deposition;Applied Physics A;2023-02-05

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号京ICP备18003416号-3