An innovative method for preparation of sol–gel HfO2 films with high laser-induced damage threshold after high-temperature annealing-Reference-Cited by-同舟云学术

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An innovative method for preparation of sol–gel HfO2 films with high laser-induced damage threshold after high-temperature annealing

Published:2021-07 Issue: Volume:554 Page:149615
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Zhang Miao,Zhu Yongqiao,Li Dawei,Feng Peizhong,Xu Cheng

Funder

Fundamental Research Funds for the Central Universities

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference35 articles.

1. HfO2 films with high laser damage threshold;Alvisi;Thin Solid Films,2000

2. Laser damage dependence on structural and optical properties of ion-assisted HfO2 thin films;Alvisi;Thin Solid Films,2001

3. Interface control and modification of band alignment and electrical properties of HfTiO/GaAs gate stacks by nitrogen incorporation;He;J. Mater. Chem. C,2014

4. Modulating the Interface Quality and Electrical Properties of HfTiO/InGaAs Gate Stack by Atomic-Layer-Deposition-Derived Al2O3 Passivation Layer;He;ACS Appl. Mater. Interfaces,2014

5. Interface engineering and chemistry of Hf-based high-k dielectrics on III–V substrates;He;Surf. Sci. Rep.,2013

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