Enabling Large-Area Selective Deposition on Metal-Dielectric Patterns using Polymer Brush Deactivation
Author:
Affiliation:
1. AMBER Centre and CRANN, Trinity College Dublin, Dublin 2, Ireland
2. Institute for Applied Materials, Karlsruhe Institute of Technology, Hermann-von-Helmholtz-Platz 1, 76344 Eggenstein-Leopoldshafen, Germany
Funder
Science Foundation Ireland
Intel Corporation
Publisher
American Chemical Society (ACS)
Subject
Surfaces, Coatings and Films,Physical and Theoretical Chemistry,General Energy,Electronic, Optical and Magnetic Materials
Link
https://pubs.acs.org/doi/pdf/10.1021/acs.jpcc.8b04092
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