Characterization of Electronic Transport through Amorphous TiO2 Produced by Atomic Layer Deposition-Reference-Cited by-同舟云学术

Characterization of Electronic Transport through Amorphous TiO2 Produced by Atomic Layer Deposition

Published:2019-06-19 Issue:33 Volume:123 Page:20116-20129
ISSN:1932-7447
Container-title:The Journal of Physical Chemistry C
language:en
Short-container-title:J. Phys. Chem. C

Author:

Nunez Paul,Richter Matthias H.^ORCID,Piercy Brandon D.¹,Roske Christopher W.,Cabán-Acevedo Miguel,Losego Mark D.¹^ORCID,Konezny Steven J.²³,Fermin David J.⁴^ORCID,Hu Shu²⁵^ORCID,Brunschwig Bruce S.,Lewis Nathan S.^ORCID

Affiliation:

1. School of Materials Science and Engineering, Georgia Institute of Technology, Atlanta, Georgia 30332, United States

2. Energy Sciences Institute, Yale West Campus, West Haven, Connecticut 06516, United States

3. Department of Chemistry, Yale University, 225 Prospect Street, P.O. Box 208107, New Haven, Connecticut 06520-8107, United States

4. School of Chemistry, University of Bristol, Cantock’s Close, Bristol BS8 1TS, U.K.

5. Department of Chemical and Environmental Engineering, School of Engineering and Applied Sciences, Yale University, New Haven, Connecticut 06520, United States

Funder

Engineering and Physical Sciences Research Council

Link Foundation

Division of Graduate Education

Office of Science

Tomkat Foundation

Publisher

American Chemical Society (ACS)

Subject

Surfaces, Coatings and Films,Physical and Theoretical Chemistry,General Energy,Electronic, Optical and Magnetic Materials

Link

https://pubs.acs.org/doi/pdf/10.1021/acs.jpcc.9b04434