Volatile Products from Ligand Addition of P(CH3)3 to NiCl2, PdCl2, and PtCl2: Pathway for Metal Thermal Atomic Layer Etching
Author:
Affiliation:
1. Department of Chemistry, University of Colorado, Boulder, Colorado 80309, United States
2. Lam Research Corporation, Fremont, California 94538, United States
Funder
Lam Research Corporation
Publisher
American Chemical Society (ACS)
Subject
Surfaces, Coatings and Films,Physical and Theoretical Chemistry,General Energy,Electronic, Optical and Magnetic Materials
Link
https://pubs.acs.org/doi/pdf/10.1021/acs.jpcc.1c10690
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