Indium Oxide Thin Films by Atomic Layer Deposition Using Trimethylindium and Ozone
Author:
Affiliation:
1. Argonne National Laboratory, 9700 South Cass Avenue, Lemont, Illinois 60439, United States
2. SAFC Hitech, 1429 Hilldale Avenue, Haverhill, Massachusetts 01832, United States
Funder
Basic Energy Sciences
Solar Energy Technologies Program
Publisher
American Chemical Society (ACS)
Subject
Surfaces, Coatings and Films,Physical and Theoretical Chemistry,General Energy,Electronic, Optical and Magnetic Materials
Link
https://pubs.acs.org/doi/pdf/10.1021/acs.jpcc.6b02657
Reference79 articles.
1. Reactive magnetron sputtering of tin-doped indium oxide (ITO): influence of argon pressure and plasma excitation mode
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3. Conductivity in transparent oxide semiconductors
4. Heat mirror coatings for energy conserving windows
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