Reactive magnetron sputtering of tin-doped indium oxide (ITO): influence of argon pressure and plasma excitation mode

Author:

Mientus R.,Ellmer K.

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Reference24 articles.

1. Study on Crystallinity of Tin-Doped Indium Oxide Films Deposited by DC Magnetron Sputtering

2. Characterization of a RF/dc-magnetron discharge for the sputter deposition of transparent and highly conductive ITO films

3. K. Ellmer, R. Mientus, V. Weiß and H. Rossner, Nucl. Instr. Meth. Phys. Res. A accepted (2001).

4. K. Ellmer and R. Mientus, Proceedings of the 4th International Symposium on Trends and New Applications in Thin Films/11th Conference on High Vacuum, Interfaces and Thin Films, Dresden, March, 1994, DGM Informationsgesellschaft mbH, Oberursel, City, p. 131.

5. Reactive DC magnetron sputtering of elemental targets in Ar/N2 mixtures: relation between the discharge characteristics and the heat of formation of the corresponding nitrides

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