Low-temperature atomic layer deposition of indium oxide thin films using trimethylindium and oxygen plasma-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Low-temperature atomic layer deposition of indium oxide thin films using trimethylindium and oxygen plasma

Published:2021-12 Issue:6 Volume:39 Page:062406
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A
language:en
Short-container-title:Journal of Vacuum Science & Technology A

Author:

Mahmoodinezhad Ali¹^ORCID,Morales Carlos¹^ORCID,Naumann Franziska²^ORCID,Plate Paul²^ORCID,Meyer Robert²^ORCID,Janowitz Christoph¹^ORCID,Henkel Karsten¹^ORCID,Kot Małgorzata¹^ORCID,Zoellner Marvin Hartwig³^ORCID,Wenger Christian³^ORCID,Flege Jan Ingo¹^ORCID

Affiliation:

1. Applied Physics and Semiconductor Spectroscopy, Brandenburg University of Technology Cottbus–Senftenberg, K.-Zuse-Str. 1, 03046 Cottbus, Germany

2. SENTECH Instruments GmbH, Schwarzschildstraße 2, 12489 Berlin, Germany

3. IHP—Leibniz-Institut für innovative Mikroelektronik, Im Technologiepark 25, 15236 Frankfurt (Oder), Germany

Funder

Bundesministerium für Wirtschaft und Energie

Graduate Research School of BTU Cottbus-Senftenberg

Bundesministerium für Bildung und Forschung

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

https://avs.scitation.org/doi/pdf/10.1116/6.0001375

Cited by 5 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Bottom-Up Design of a Supercycle Recipe for Atomic Layer Deposition of Tunable Indium Gallium Zinc Oxide Thin Films;ACS Applied Electronic Materials;2024-07-27

2. Unveiling growth mechanisms of PEALD In₂O₃ thin films with amide-based versus alkyl-based novel indium precursors;Journal of Materials Chemistry C;2024

3. InOx Doped SnO₂ Nanostructure Deposited on MEMS Device by PE-ALD Process for Detection of NO₂;Journal of The Electrochemical Society;2023-02-01

4. Achieving over 10% device efficiency in Cu2ZnSn(S,Se)4 thin-film solar cells with modifications of window layer properties;Journal of Alloys and Compounds;2023-01

5. Plasma-enhanced atomic-layer-deposited indium oxide thin film using a DMION precursor within a wide process window;Ceramics International;2022-10

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号京ICP备18003416号-3