Low-temperature atomic layer deposition of indium oxide thin films using trimethylindium and oxygen plasma-Reference-Cited by-同舟云学术

Low-temperature atomic layer deposition of indium oxide thin films using trimethylindium and oxygen plasma

Published:2021-12 Issue:6 Volume:39 Page:062406
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A
language:en
Short-container-title:Journal of Vacuum Science & Technology A

Author:

Mahmoodinezhad Ali¹^ORCID,Morales Carlos¹^ORCID,Naumann Franziska²^ORCID,Plate Paul²^ORCID,Meyer Robert²^ORCID,Janowitz Christoph¹^ORCID,Henkel Karsten¹^ORCID,Kot Małgorzata¹^ORCID,Zoellner Marvin Hartwig³^ORCID,Wenger Christian³^ORCID,Flege Jan Ingo¹^ORCID

Affiliation:

1. Applied Physics and Semiconductor Spectroscopy, Brandenburg University of Technology Cottbus–Senftenberg, K.-Zuse-Str. 1, 03046 Cottbus, Germany

2. SENTECH Instruments GmbH, Schwarzschildstraße 2, 12489 Berlin, Germany

3. IHP—Leibniz-Institut für innovative Mikroelektronik, Im Technologiepark 25, 15236 Frankfurt (Oder), Germany

Funder

Bundesministerium für Wirtschaft und Energie

Graduate Research School of BTU Cottbus-Senftenberg

Bundesministerium für Bildung und Forschung

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

https://avs.scitation.org/doi/pdf/10.1116/6.0001375

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