Inelastic H Atom Scattering from Ultrathin Aluminum Oxide Films Grown by Atomic Layer Deposition on Pt(111)-Reference-Cited by-同舟云学术

Inelastic H Atom Scattering from Ultrathin Aluminum Oxide Films Grown by Atomic Layer Deposition on Pt(111)

Author:

Dorenkamp Yvonne,Volkmann Christian¹,Roddatis Vladimir²,Schneider Sven¹^ORCID,Wodtke Alec M.³^ORCID,Bünermann Oliver³^ORCID

Affiliation:

1. Institute for Inorganic Chemistry, University of Göttingen, Tammannstr. 4, 37077 Göttingen, Germany

2. Institute of Materials Physics, University of Göttingen, Friedrich-Hund-Platz 1, 37077 Göttingen, Germany

3. Department of Dynamics at Surfaces, Max-Planck Institute for Biophysical Chemistry, Am Faßberg 11, 37077 Göttingen, Germany

Funder

Agence Nationale de la Recherche

Deutsche Forschungsgemeinschaft

Alexander von Humboldt-Stiftung

Volkswagen Foundation

Nieders?chsische Ministerium f?r Wissenschaft und Kultur

Publisher

American Chemical Society (ACS)

Subject

Surfaces, Coatings and Films,Physical and Theoretical Chemistry,General Energy,Electronic, Optical and Magnetic Materials

Link

Reference28 articles.

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