Porous SiOCH Thin Films Obtained by Foaming
Author:
Affiliation:
1. Université Grenoble Alpes, F-38000 Grenoble, France
2. CEA, LETI, MINATEC Campus, F-38054 Grenoble, France
Publisher
American Chemical Society (ACS)
Subject
Surfaces, Coatings and Films,Physical and Theoretical Chemistry,General Energy,Electronic, Optical and Magnetic Materials
Link
https://pubs.acs.org/doi/pdf/10.1021/acs.jpcc.6b00204
Reference48 articles.
1. Ultra-Low-k by CVD: Deposition and Curing
2. Porous pSiCOH Ultralow-k Dielectrics for Chip Interconnects Prepared by PECVD
3. A new method for hermeticity measurements using porous ultra low k dielectrics for sub-ppm moisture detection
4. Novel stationary phase for silicon gas chromatography microcolumns
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