Modification of Plasma-Polymerized Organosiloxane Films by Irradiation with He+, Ne+, Ar+, and Kr+ Ions
Author:
Affiliation:
1. Instituto de Física Gleb Wataghin, Universidade Estadual de Campinas, 13.083-970, Campinas, SP, Brazil
2. Instituto de Química, Universidade Estadual de Campinas, 13.083-970, Campinas, SP, Brazil
Publisher
American Chemical Society (ACS)
Subject
Materials Chemistry,General Chemical Engineering,General Chemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/cm051007o
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