Fluorescent Labeling to Investigate Nanopatterning Processes in Extreme Ultraviolet Lithography-Reference-Cited by-同舟云学术

Fluorescent Labeling to Investigate Nanopatterning Processes in Extreme Ultraviolet Lithography

Published:2021-10-20 Issue:43 Volume:13 Page:51790-51798
ISSN:1944-8244
Container-title:ACS Applied Materials & Interfaces
language:en
Short-container-title:ACS Appl. Mater. Interfaces

Author:

Wu Lianjia¹^ORCID,Hilbers Michiel F.²,Lugier Olivier¹,Thakur Neha¹^ORCID,Vockenhuber Michaela³,Ekinci Yasin³,Brouwer Albert M.¹²^ORCID,Castellanos Sonia¹^ORCID

Affiliation:

1. Advanced Research Center for Nanolithography, Science Park 106, Amsterdam 1098XG, The Netherlands

2. Van ’t Hoff Institute for Molecular Sciences, University of Amsterdam, P.O. Box 94157, Amsterdam 1090 GD, The Netherlands

3. Laboratory of Micro and Nanotechnology, Paul Scherrer Institute, Forschungsstrasse 111, Villigen 5232, Switzerland

Publisher

American Chemical Society (ACS)

Subject

General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/acsami.1c16257

Reference41 articles.

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