Soft X-ray absorption and fragmentation of tin-oxo cage photoresists-Reference-Cited by-同舟云学术

Soft X-ray absorption and fragmentation of tin-oxo cage photoresists

Published:2024 Issue: Volume: Page:
ISSN:1463-9076
Container-title:Physical Chemistry Chemical Physics
language:en
Short-container-title:Phys. Chem. Chem. Phys.

Author:

Haitjema Jarich¹^ORCID,Castellanos Sonia¹^ORCID,Lugier Olivier¹,Bespalov Ivan¹^ORCID,Lindblad Rebecka²³,Timm Martin³,Bülow Christine³⁴,Zamudio-Bayer Vicente³^ORCID,Lau J. Tobias³⁴^ORCID,von Issendorff Bernd⁴,Hoekstra Ronnie¹⁵,Witte Katharina⁶,Watts Benjamin⁶^ORCID,Schlathölter Thomas⁵⁷^ORCID,Brouwer Albert M.¹⁸^ORCID

Affiliation:

1. Advanced Research Center for Nanolithography, P.O. Box 93019, 1090 BA Amsterdam, The Netherlands

2. Department of Physics, Lund University, 22100 Lund, Sweden

3. Abteilung für Hochempfindliche Röntgenspektroskopie, Helmholtz Zentrum Berlin für Materialien und Energie, Albert-Einstein-Straße 15, 12489 Berlin, Germany

4. Physikalisches Institut, Albert-Ludwigs-Universität Freiburg, Hermann-Herder-Straße 3, 79104 Freiburg, Germany

5. Zernike Institute for Advanced Materials, Rijksuniversiteit Groningen, Nijenborgh 4, 9747 AG Groningen, The Netherlands

6. Paul Scherrer Institut, Villigen 5232, Switzerland

7. University College Groningen, University of Groningen, Hoendiepskade 23/24, 9718 BG Groningen, The Netherlands

8. University of Amsterdam, van’t Hoff Institute for Molecular Sciences, P.O. Box 94157, 1090 GD Amsterdam, The Netherlands

Abstract

K-edge photoexcitation of n-butyltin-oxo cage photoresist cores leads to (multiple) ionization and butyl group loss.

Funder

Vetenskapsrådet

Bundesministerium für Bildung und Forschung

Paul Scherrer Institut

Helmholtz Center Berlin for Materials and Energy

Publisher

Royal Society of Chemistry (RSC)

Subject

Physical and Theoretical Chemistry,General Physics and Astronomy

Link

http://pubs.rsc.org/en/content/articlepdf/2024/CP/D3CP05428D

Reference79 articles.

1. Photolithographic properties of tin-oxo clusters using extreme ultraviolet light (13.5nm)

2. Extreme ultraviolet patterning of tin-oxo cages

3. Effect of Ambient Conditions on Radiation-Induced Chemistries of a Nanocluster Organotin Photoresist for Next-Generation EUV Nanolithography

4. Thermal and radiation chemistry of butyltin oxo hydroxo: A model inorganic photoresist

5. Effect of Oxygen on Thermal and Radiation-Induced Chemistries in a Model Organotin Photoresist