Synthesis and Characterization of Atomically Flat Methyl-Terminated Ge(111) Surfaces
Author:
Affiliation:
1. Division of Chemistry and Chemical Engineering, ‡Joint Center for Artificial Photosynthesis, §Beckman Institute, and ∥Kavli Nanoscience Institute, California Institute of Technology, Pasadena, California 91125, United States
Funder
Office of Science
Gordon and Betty Moore Foundation
Division of Chemistry
Publisher
American Chemical Society (ACS)
Subject
Colloid and Surface Chemistry,Biochemistry,General Chemistry,Catalysis
Link
https://pubs.acs.org/doi/pdf/10.1021/jacs.5b03339
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1. Hafnium oxide gate dielectrics on sulfur-passivated germanium
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