An Alkaline-Developable, Chemically Amplified, Negative-Type Photosensitive Poly(benzoxazole) Resist Based on Poly(o-hydroxy amide), an Active Ester-Type Cross-Linker, and a Photobase Generator
Author:
Affiliation:
1. Department of Organic and Polymeric Materials, Graduate School of Science and Engineering, Tokyo Institute of Technology, 2-12-1 O-okayama, Meguro-ku, Tokyo, 152-8552, Japan
Publisher
American Chemical Society (ACS)
Subject
Materials Chemistry,Inorganic Chemistry,Polymers and Plastics,Organic Chemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/ma802349b
Reference23 articles.
1. New high temperature stable positive photoresists based on hydroxy polyimides and polyamides containing the hexafluoroisopropylidene (6-f) linking group
2. Photoreactive polymers for electronics
3. A study of novel heat-resistant polymers: Preparation of photosensitive fluorinated polybenzoxazole precursors and physical properties of polybenzoxazoles derived from the precursors
4. Photosensitive poly(benzoxazole) based on precursor from diphenyl isophthalate and bis(o-aminophenol)
5. Dissolution inhibition mechanisms of naphthoquinone diazides
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