Author:
Koshiba Mitsunobu,Murata Makoto,Harita Yoshiyuki,Yamaoka Tsuguo
Subject
Materials Chemistry,Polymers and Plastics,General Chemistry,Materials Chemistry,Polymers and Plastics,General Chemistry
Reference4 articles.
1. Ultramicrolithography and the Resist Materials, p. 91, CMC, Tokyo (1985).
2. and Quinone Diazides, p. 114, Elsevier Scientific Publishing, Amsterdam (1981).
3. Novolak Design For High Resolution Positive Photoresists
4. and Proceedings of SPIE Symposium, in press (1988).
Cited by
11 articles.
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