Photoresist materials comprising photobase generators and epoxy resins bearing carboxylic acids to lead to marked enhancement of base-catalyzed cross-linking reactions-Reference-Cited by-同舟云学术

Photoresist materials comprising photobase generators and epoxy resins bearing carboxylic acids to lead to marked enhancement of base-catalyzed cross-linking reactions

Published:2018-11-08 Issue:2 Volume:30 Page:304-311
ISSN:1042-7147
Container-title:Polymers for Advanced Technologies
language:en
Short-container-title:Polym Adv Technol

Author:

Terada Kiwamu¹²,Furutani Masahiro²,Arimitsu Koji²^ORCID

Affiliation:

1. Functional Chemicals R&D Laboratories; Nippon Kayaku Company Ltd.; 3-31-12 Shimo, Kita Tokyo 115-8588 Japan

2. Department of Pure and Applied Chemistry, Faculty of Science and Technology; Tokyo University of Science 2641 Yamazaki; Noda Chiba 278-8510 Japan

Publisher

Wiley

Subject

Polymers and Plastics

Link

http://onlinelibrary.wiley.com/wol1/doi/10.1002/pat.4466/fullpdf

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5. Single-mode TE00-TM00 optical waveguides on SU-8 polymer;Beche;Optics Commun,2004

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