X-ray Absorption Spectroscopy To Probe Surface Composition and Surface Deprotection in Photoresist Films-Reference-Cited by-同舟云学术

X-ray Absorption Spectroscopy To Probe Surface Composition and Surface Deprotection in Photoresist Films

Published:2005-03-31 Issue:9 Volume:21 Page:4007-4015
ISSN:0743-7463
Container-title:Langmuir
language:en
Short-container-title:Langmuir

Author:

Lenhart Joseph L.¹,Fischer Daniel A.¹,Sambasivan Sharadha¹,Lin Eric K.¹,Jones Ronald L.¹,Soles Christopher L.¹,Wu Wen-li¹,Goldfarb Dario L.¹,Angelopoulos Marie¹

Affiliation:

1. Sandia National Laboratories, P.O. Box 5800, MS 0888, Albuquerque, New Mexico 87185, National Institute of Standards and Technology, 100 Bureau Drive, Gaithersburg, Maryland 20899, and IBM, T. J. Watson Research Center, Yorktown Heights, New York 10598

Publisher

American Chemical Society (ACS)

Subject

Electrochemistry,Spectroscopy,Surfaces and Interfaces,Condensed Matter Physics,General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/la047160z

Reference43 articles.

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2. Lithographic Imaging Techniques for the Formation of Nanoscopic Features

3. Chemical amplification mechanisms for microlithography

4. Chemical and physical aspects of the post-exposure baking process used for positive-tone chemically amplified resists

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