Chemical and physical aspects of the post-exposure baking process used for positive-tone chemically amplified resists-Reference-Cited by-同舟云学术

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Chemical and physical aspects of the post-exposure baking process used for positive-tone chemically amplified resists

Published:2001-09 Issue:5 Volume:45 Page:667-682
ISSN:0018-8646
Container-title:IBM Journal of Research and Development
language:
Short-container-title:IBM J. Res. & Dev.

Author:

Hinsberg W. D.,Houle F. A.,Sanchez M. I.,Wallraff G. M.

Publisher

IBM

Subject

General Computer Science

Link

http://xplorestaging.ieee.org/ielx5/5288520/5389064/05389067.pdf?arnumber=5389067

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