Photodegradable Polyurethane Resist with High Photosensitivity Based on Hexaarylbiimidazole Molecule Photoswitch-Reference-Cited by-同舟云学术

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Photodegradable Polyurethane Resist with High Photosensitivity Based on Hexaarylbiimidazole Molecule Photoswitch

Published:2024-02-27 Issue:5 Volume:6 Page:2496-2503
ISSN:2637-6105
Container-title:ACS Applied Polymer Materials
language:en
Short-container-title:ACS Appl. Polym. Mater.

Author:

Xiang Shi-Li¹,Luo Peng-Fei²,Ren Ying-Yi²,Peng Ling-Yan²,Yin Hong³,Huang Jun-Dan²,Hong Pan²,Yu Qi²,Tian Rui²,Li Chong²^ORCID,Liu Jun¹,Zhu Ming-Qiang²^ORCID

Affiliation:

1. Hubei Jiufengshan Laboratory, Wuhan 430206, China

2. Wuhan National Laboratory for Optoelectronics, School of Optical and Electronic Information, Huazhong University of Science and Technology, Wuhan, Hubei 430074, China

3. International Iberian Nanotechnology Laboratory (INL), Av. Mestre Jose Veiga, 4715-330 Braga, Portugal

Funder

National Key Research and Development Program of China

Natural Science Foundation of Hubei Province

Fundamental Research Funds for the Central Universities

National Natural Science Foundation of China

Wuhan Basic Research

Publisher

American Chemical Society (ACS)

Link

https://pubs.acs.org/doi/pdf/10.1021/acsapm.3c02610

Reference49 articles.

1. Hinsberg, W. D.; Wallraff, G. M. Lithographic Resists. In Encyclopedia of Polymer Science and Technology; Wiley, 2012.

2. Chemical Amplification Resists for Microlithography

3. Novolac-based resists

4. Development of New Advanced Resist Materials for Microlithography

5. Novolak Design For High Resolution Positive Photoresists(II): Stone Wall Model For Positive Photoresist Development

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