Ozone-Based Atomic Layer Deposition of Alumina from TMA: Growth, Morphology, and Reaction Mechanism
Author:
Affiliation:
1. Tyndall National Institute, Lee Maltings, Cork, Ireland
2. CNR-INFM MDM National Laboratory, Via C. Olivetti 2, 20041 Agrate Brianza, Italy
3. STMicroelectronics, via C. Olivetti 2, 20041 Agrate Brianza, Italy
Publisher
American Chemical Society (ACS)
Subject
Materials Chemistry,General Chemical Engineering,General Chemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/cm0608903
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