Complementary Characterization of Buried Nanolayers by Quantitative X-ray Fluorescence Spectrometry under Conventional and Grazing Incidence Conditions
Author:
Affiliation:
1. Physikalisch-Technische Bundesanstalt, Abbestrasse 2-12, 10587 Berlin, Germany
Publisher
American Chemical Society (ACS)
Subject
Analytical Chemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/ac202074s
Reference20 articles.
1. Thickness determination for Cu and Ni nanolayers: Comparison of completely reference-free fundamental parameter-based X-ray fluorescence analysis and X-ray reflectometry
2. Characterisation of High-k Containing Nanolayers by Reference-Free X-Ray Fluorescence Analysis with Synchrotron Radiation
3. High Depth Resolution Depth Profile Analysis of Ultra Thin High-κ Hf Based Films using MEIS Compared with XTEM, XRF, SE and XPS
4. Glancing-incidence x-ray fluorescence of layered materials
5. Reference-Free Total Reflection X-ray Fluorescence Analysis of Semiconductor Surfaces with Synchrotron Radiation
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