Thickness determination for Cu and Ni nanolayers: Comparison of completely reference-free fundamental parameter-based X-ray fluorescence analysis and X-ray reflectometry

Author:

Kolbe Michael,Beckhoff Burkhard,Krumrey Michael,Ulm Gerhard

Publisher

Elsevier BV

Subject

Spectroscopy,Instrumentation,Atomic and Molecular Physics, and Optics,Analytical Chemistry

Reference22 articles.

1. High-Resolution X-Ray Scattering, from Thin Films to Lateral Nanostructures;Pietsch,2004

2. Realisation and metrological characterisation of thickness standards below 100 nm;Thomsen-Schmidt;Appl. Phys.,2004

3. Determination of the thickness of coatings by means of a new XRF spectrometer;Fiorini;X-ray Spectrom.,2002

4. Absolute mass thickness determination of thin samples by X-ray fluorescence analysis;Barrea;Nucl. Instrum. Methods,1998

5. Quantitative thickness determination using X-ray fluorescence: application to multiple layers;Nygård;X-ray Spectrom.,2004

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