Growth of p-Type Tin(II) Monoxide Thin Films by Atomic Layer Deposition from Bis(1-dimethylamino-2-methyl-2propoxy)tin and H2O-Reference-Cited by-同舟云学术

Growth of p-Type Tin(II) Monoxide Thin Films by Atomic Layer Deposition from Bis(1-dimethylamino-2-methyl-2propoxy)tin and H2O

Published:2014-10-23 Issue:21 Volume:26 Page:6088-6091
ISSN:0897-4756
Container-title:Chemistry of Materials
language:en
Short-container-title:Chem. Mater.

Author:

Han Jeong Hwan¹,Chung Yoon Jang¹,Park Bo Keun¹,Kim Seong Keun²,Kim Hyo-Suk¹,Kim Chang Gyoun¹,Chung Taek-Mo¹

Affiliation:

1. Division of Advanced Materials, Korea Research Institute of Chemical Technology (KRICT), 141 Gajeong-Ro, Yuseong-Gu, Daejeon 305-600, Republic of Korea

2. Electronic Materials Research Center, Korea Institute of Science and Technology, Seoul, 136-791, Republic of Korea

Funder

National Research Council of Science & Technology (NST) of Republic of Korea

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,General Chemical Engineering,General Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/cm503112v

Reference30 articles.

1. Oxide Semiconductor Thin-Film Transistors: A Review of Recent Advances

2. Highly sensitive and selective gas sensors using p-type oxide semiconductors: Overview

3. Metal Oxides for Dye-Sensitized Solar Cells

4. Room-temperature fabrication of transparent flexible thin-film transistors using amorphous oxide semiconductors

5. Transparent ZnO-TFT Arrays Fabricated by Atomic Layer Deposition

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