Dry etching and sputtering
Author:
Affiliation:
1. Department of Electronics and Electrical Engineering, University of Glasgow, Glasgow G12 9UY, UK ()
2. Department of Physics and Astronomy, University of Glasgow, Glasgow G12 9UY, UK
Publisher
The Royal Society
Subject
General Physics and Astronomy,General Engineering,General Mathematics
Link
https://royalsocietypublishing.org/doi/pdf/10.1098/rsta.2003.1307
Reference23 articles.
1. Ultra low energy (100–2000 eV) boron implantation into crystalline and silicon-preamorphized silicon
2. Chapman B. N. 1980 Glow discharge processes: sputtering and plasma etching. Wiley.
3. Reactive ion etching of GaAs using a mixture of methane and hydrogen
4. Ion‐ and electron‐assisted gas‐surface chemistry—An important effect in plasma etching
5. Enhanced damage due to light in low-damage reactive-ion etching processes
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