A Study on a Relationship Between Sputtering Condition and Electrochemical Property of Molybdenum Thin Films in Phosphoric Acid Solution-Reference-Cited by-同舟云学术

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A Study on a Relationship Between Sputtering Condition and Electrochemical Property of Molybdenum Thin Films in Phosphoric Acid Solution

Published:2016-04-01 Issue:4 Volume:8 Page:854-860
ISSN:1947-2935
Container-title:Science of Advanced Materials
language:en
Short-container-title:sci adv mater

Author:

Seo Bo-Hyun,Kim Hongsik,Choe Heehwan,Jeon Jae-Hong,Winkler Jörg,Lee Yonguk,Kim Soo-Hyun,Seo Jong Hyun

Publisher

American Scientific Publishers

Subject

General Materials Science

Cited by 5 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Characterization of Mo-6Ta alloy targets and its magnetron sputtering deposited thin film;International Journal of Refractory Metals and Hard Materials;2022-02

2. 27.3: Invited Paper: Electrochemical study on wet etching of copper/molybdenum alloys in thin film transistors;SID Symposium Digest of Technical Papers;2019-09

3. Effect of Fluoride Ions on Wet Etching of Copper/ Molybdenum in Hydrogen Peroxide Solution;Journal of Nanoscience and Nanotechnology;2019-03-01

4. Determining Interfacial Shear Bond Strength in Thin Laminated Metal Composites;Science of Advanced Materials;2018-11-01

5. P-14: Prevention of Indium Segregation in BCE Type InGaZnO TFTs with Titanium Source/Drain;SID Symposium Digest of Technical Papers;2017-05

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