Influence of Si on the Structural, Electrical, and Optical Properties of (Al, Ti, Si)N Films Deposited Via Reactive DC Sputtering-Reference-Cited by-同舟云学术

Influence of Si on the Structural, Electrical, and Optical Properties of (Al, Ti, Si)N Films Deposited Via Reactive DC Sputtering

Published:2020 Issue:6 Volume:23 Page:
ISSN:1980-5373
Container-title:Materials Research
language:
Short-container-title:Mat. Res.

Author:

Palacios A.M. Guzman¹,Olaya J.J.¹^ORCID,Alfonso J.E.¹^ORCID

Affiliation:

1. Universidad Nacional de Colombia, Colombia

Publisher

FapUNIFESP (SciELO)

Subject

Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science

Link

http://www.scielo.br/pdf/mr/v23n6/1516-1439-mr-23-6-e20190687.pdf

Reference37 articles.

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2. The influence of growth defects in sputter-deposited TiAlN hard coatings on their tribological behavior;Panjan P;Surf Coat Tech,2016

3. Influence of deposition angle on the structural, morphological and optical properties of sputtered AlN thin films;Ravankhah M;Optik (Stuttg)

4. TiAlN and TiAlCN deposition in an industrial PaCVD-plant;Heim D;Surf Coat Tech,1998

5. Influence of the abrasive particles size in the micro-abrasion wear tests of TiAlSiN thin coatings;Andrade MFC;Wear,2009

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1. High temperature tribological properties of TiAlSiN/NiCr multilayer coatings with different modulation periods;Ceramics International;2024-07

2. Effects of Cr Concentration on the Structure and the Electrical and Optical Properties of Ti-Al-Cr-N Thin Films Prepared by Means of Reactive Co-Sputtering;Crystals;2022-12-15