TiAlN and TiAlCN deposition in an industrial PaCVD-plant
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry
Reference7 articles.
1. Plasmabeschichtungsverfahren und Hartstoffschichten;Rother,1992
2. Neue Entwicklungen zur Herstellung von Hartstoffschichten mittles Plasma-CVD
3. On structure and properties of sputtered Ti and Al based hard compound films
4. Titanium aluminum nitride films: A new alternative to TiN coatings
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