Dry Etching of SiC for Advanced Device Applications

Abstract

AbstractIn this paper we review and compare most of the published results on dry etching of silicon carbide using various techniques. The vast majority of reports have used RIE methods due to the wide availability of such reactors. Recently, alternative methods of magnetron enhanced RIE (MIE) and electron cyclotron resonance (ECR) plasmas have been demonstrated. MIE has resulted in extremely high etch rates and ECR etching has resulted in smooth, residue-free surfaces with an ability to control the etched profiles.