Low Pressure OMVPE Grown Compressive Strained Ingaas QWS Surrounded by Tensile Strained Ingaas Spacers

Author:

Laboutine O. A.,Choo A. G.,Kim S. H.,Kim N. H.,Park H. S.,Park Y. J.,Kim T. I.

Abstract

AbstractThe photoluminescence (PL) measurement of unstrained and compressive strained InxGa1−xAs quantum wells (QWs) demonstrated that the interfaces had a roughness of 1 to 2.5 monolayers (ML). The spacer layers of tensile strained InyGa1−yAs were inserted between a compressive strained In0.7Ga0.3As QW and the InP barrier layers. PL spectra of the In0.7Ga0.3As/InyGa1−yAs/InP structures grown at 605°C became significantly narrower with increasing Ga content in the spacer layers above (1−y)=0.6. The PL line width of the In0.7Ga0.3As/In0.3Ga0.7As alternatingly strained multiple quantum well (MQW) structures gradually decreased when the number of periods and the deposition temperature increased. The structure, consisting of 4 periods grown at 635°C, exhibited a PL line width of about 4 meV which corresponded to the QW thickness fluctuation of 0.5 ML. The superlattice satellites of X-ray rocking curves of MQW structures were better defined under an envelope corresponding to the tensile strained layers.

Publisher

Springer Science and Business Media LLC

Subject

General Engineering

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