Author:
Krishnaswamy J.,Li L.,Collins G. J.,Hiraoka H.,Caolo M. A.
Abstract
A 25 kV pulsed electron beam was used to harden 0.5−3.0μm thick AZ-type, MacDermid, and polyamic acid (PMDA + ODA) resist patterns. The resist profiles are stable against high-temperature treatment that ranges between 200−350 °C. The short pulse ∼ 100 ns, electron beams employed in resist hardening are produced from a cold cathode in 30−50 m Torr air by discharging energy stored in a 7.5 nF capacitor producing a dose/pulse ∼ 1μC/cm2 at the processed surface. Comparisons with conventional hardening methods using ultraviolet emission from a high-pressure mercury lamp, a windowless, vacuum ultraviolet (VUV) lamp, and low-energy electron emission from a cw source are also made.
Publisher
Springer Science and Business Media LLC
Subject
Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science
Reference23 articles.
1. Direct Patterning Of Polyimide By Pulsed Electron Beams In Soft Vacuum
2. UV hardening of photo‐ and electron beam resist patterns
3. 15 Srinivasan R. , IBM Journal of Research and Developoment, RC 9177 (1981)
4. see also R. Srinivasan and B. Braren, J. Polym. Sci. 22, 2601 (1984).
Cited by
3 articles.
订阅此论文施引文献
订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献