Pulsed electron beam lithography in soft vacuum
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Published:1990-01
Issue:1
Volume:8
Page:39
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ISSN:0734-211X
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Container-title:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
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language:
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Short-container-title:J. Vac. Sci. Technol. B
Publisher
American Vacuum Society
Subject
General Engineering
Cited by
3 articles.
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1. Modification of fluoropolymer surfaces with electronically conductive polymers;Synthetic Metals;1994-01
2. Large-area electron-beam source;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1993-11
3. Broad area, intense electron beam source for high resolution, high throughput semiconductor lithography;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1993-09