Critical Review of 1-Particle Models in Electromigration Resistance Change Modeling

Author:

Niehof J.,Graaff H.C. de,Mouthaan A.J.,Verwey J.F.

Abstract

ABSTRACTAn investigation is made into the capability of one-particle models in modeling electromigration-induced resistance changes. Analytically obtained solutions to the model equations are used to gain more insight into the vacancy distribution as a result of the applied boundary conditions. These solutions are then used to determine the resistance change modeling capabilities of three types of one-particle models.

Publisher

Springer Science and Business Media LLC

Subject

General Engineering

Reference13 articles.

1. [13] Liew B.K. , Fang P. , Cheung N.W. , Hu C. , Proc. IRPS, p. 111, 1990.

2. [9] Niehof J. , PhD Thesis, University of Twente, The Netherlands, to be published October 1994.

3. [8] Möckl U. , Diplom Arbeit Univ. Stuttgart/Max Planck Institute für Metallforschung, 1992.

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