Issues in accelerated electromigration of solder bumps

Author:

Rinne Glenn A.

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Safety, Risk, Reliability and Quality,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference10 articles.

1. Investigation of the temperature dependence in Black’s equation using microscopic electromigration modeling;Tammaro;J. Appl. Phys.,1999

2. Gupta D, Oberschmidt JM. Diffusion processes in lead based solders used in microelectronic industry. In: Presented at Proceedings of Design and Reliability of Solders and Solder Interconnections Symposium, Orlando, FL, USA, 1997; 59–64

3. Black JR. Current limitations of thin film conductors. In: Presented at 20th Annual International Reliability Physics Symposium, 1967

4. Pekin S. Package level electromigration FPBGA packages. In: Presented at Wafer Level Packaging Seminar at Semicon West 2002, San Francisco, CA, 2002

5. Grain size dependence of electromigration-induced failures in narrow interconnects;Cho;Appl. Phys. Lett.,1989

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